Single substrate RIE system with advanced software for etching oxide, nitride, polyimide and other films. Has electrode cooling, up to 3,000 watts, 200mm size, variable electrode spacing, digital mass flow control, throttle valve control, DC bias and end point options. Optional turbo pump, Inductively Coupled Plasma Source and various end point options available. We invite … [ Read More ]
Priced under $55K with factory install support and 12 month warranty The Glow Research ST1200 Plasma System delivers high end RIE anisotropic etching of silicon nitride (Si3N4), silicon oxide (SiO2), silicide, III-V compounds, polyimide and photo resist removal. The ST1200 can provide a wide variety of etch profiles ranging from anisotropic to sloped walls. … [ Read More ]
How to use a plasma system to plasma treat a silicon surface with a nitrogen gas plasma or a oxygen gas plasma. We show how to change to a hydrophilic using a DI water droplet test.
Using an energetic plasma or a glow discharge created from a gaseous species to remove impurities, organics and contaminants from surfaces is called Plasma Cleaning. Typical gases used such as argon and oxygen, produce a plasma from high frequency voltages ionizing the gas at low atmospheric pressure in a controlled sealed chamber. Organics can be … [ Read More ]
The Glow Research new YouTube channel is now live and will showcase our existing products and new products to come. You can view the channel here: https://www.youtube.com/c/GlowresearchOrg Stay tuned for exciting news about our newest product launch!