Glow Research makes Plasma systems for: Plasma surface modification, plasma etching, plasma cleaning, surface activation, organic removal, photoresist removal, decap, bonding (PDMS), and FA applications. High purity quartz chambers or anodized aluminum chambers are available.
Our higher purpose: Provide reliable plasma systems for our Customers–so they can carry out their good work with repeatable results. We want our Customers to focus on their research or production. We are extremely proud that our systems have contributed to advancements in the scientific community, MEMS, biomedical and the semiconductor industry.
Glow Research will process free samples for Customers that need to verify process results–or provide demo systems to help meet various needs.
Capability: Glow Research is one of the only plasma equipment companies that manufactures the entire system…the RF generators, match networks, control systems and chambers. This allows Glow Research to provide extremely reliable plasma systems at a price below our competitors. Our systems are used in labs, universities and production lines worldwide (see list of Customers in the “About Us” page. Due to our ability to manufacture the entire system, Glow Research also makes plasma systems under private label for other plasma companies. Glow Research plasma systems tune automatically, and generate a very uniform plasma. Glow Research plasma systems provide a uniform plasma, and tune extremely fast. Our systems are designed to strike a plasma as low as 10 watts. Our systems report the RF power actually going into the chamber in 1 watt increments.
Choice of Systems:
OptiGlow 75—our lowest priced system, used with oxygen or argon, 75 watts, 100 kHz, anodized aluminum chamber. For surface modification, plasma cleaning, prebond treatment. Table top system.
OptiGlow ACE—for use with oxygen, argon or fluorine (CF4) type gas. Two gas flowmeters, anodized aluminum chamber, variable 10 to 150 watt, 13.56 MHz RF generator, autotune. RIE or plasma processing. For Ashing, Cleaning and Etching(ACE). Ideal for removing layers for Failure Analysis, or etching a variety of films. Table top system. Common use is for Decap, plasma cleaning and Etching. Can run as low as 10 watts. Power is adjusted in one watt increments.
AutoGlow—Quartz Chamber and Quartz Sample Holder. Up to three gases, 150mm substrates, variable 10 to 300 watt 13.56 MHz RF generator, autotune. Capacitive coupled, push button automatic operation. Used for plasma cleaning, prebond, etching films, removing organics, removing photoresist. Table top system. Can run as low as 10 watts, and is adjustable in one watt incremeents.
AutoGlow 200—can process 200 mm square substrates (8” wafers). RIE or plasma processing. Up to two gases–oxygen, argon or fluorine (CF4) type gas, variable 10 to 600 watt 13.56 MHz RF generator, autotune, anodized aluminum chamber. Used for plasma cleaning, activation, prebond, etching, removing organics, removing photoresist. Can run as low as 10 watts. Table top system with chamber view port window for Optical Emission Spectroscopy (OES) and End Point observation.
Plasma Cleaner with Quartz Chamber. This table-top system can be used at low power of 10 watts or up to 300 watts, 13.56 MHz solid state generator, automatic tuning, pressure read-out, nitrogen purge, three gas inputs and is CE marked. Perfect for treating PDMS, organic removal or photo-resist removal. Has a quartz chamber and can process up to 6″ (150 mm) substrates. Used in production fabs for removing photoresist.
Larger AutoGlow systems are available with anodized aluminum chambers to fit Customer’s requirements (RIE or Plasma processing). Pictured below right is a AutoGlow 200. Designed for up to 200 mm (8″) substrates or wafers, CF4, O2 or Ar gas, the system can be used for RIE or plasma processing depending on the sample carrier. It has an anodized aluminum chamber and can be used for etching, ashing or surface modification. End point detection is available.
The OptiGlow ACE is designed to perform Plasma Ashing, Cleaning or Etching (ACE) at 13.56 MHz. The OptiGlow ACE has two gas inputs and can be use with air, oxygen, or CF4 type gases. It has an anodized aluminum chamber and can be used for either RIE or Plasma processing. Great for a long process and removing layers on packages or semiconductor chips. Used for Failure Analysis, removing photoresist, cleaning organics, etching Parylene, surface treatment and a host of other applications.
The OptiGlow 75 system is used for Plasma Surface Modification and Plasma Treatment, Surface Activation. Easy to use with a display for chamber pressure and module status.
The OptiGlow system was the first low cost plasma system that can be used for increasing the wettability and comfort of contact lenses. The OptiGlow plasma system is also ideal for use prior to coating, laminating and deposition processes, and is highly effective at treating a wide range of substrates or material.
The OptiGlow 75 plasma system has an anodized aluminum chamber, 100 kHz, 75 watts of power and the option to use up to two input gases, such as oxygen or argon. Used for surface modification, preclean, organic removal and stripping photoresist.
Glow Research has taken over the world-wide responsibility for parts and service for several older units from Nordson MARCH (March Plasmod, March Super Plasmod, March PM-600 and March Jupiter RIE systems). Take a look at what rebuilt systems we have to offer.