Glow Research
Research and Production Plasma Cleaning Systems
AutoGlow Plasma Systems
The AutoGlow plasma cleaning system has a quartz chamber and a variable 10-300 watt 13.56 MHz solid state generator. The system provides very efficient plasma for lab and production applications with automatic tuning. Adjust power in one watt increments. For use with O2, Ar or N2 gas.
GLOW Plasma Systems
The GLOW plasma system is designed for high reliability and affordable pricing (under $6,000 dollars). It Operates at 100 kHz, ----- no tuning is required! The GLOW is suitable for lab, university or production applications. It can perform a host of applications such as plasma cleaning, removing photoresist, prebond cleaning/conditioning, PDMS bonding or organic removal.
ST1200 Plasma System
The Glow Research ST1200 Plasma System delivers high end RIE anisotropic etching of silicon nitride (Si3N4), silicon oxide (SiO2), silicide, III-V compounds, polyimide and photo resist removal. The ST1200 can provide a wide variety of etch profiles ranging from anisotropic to sloped walls.
University | Production | R&D Applications
Glow Research makes plasma cleaning systems that are easy to use, extremely reliable and produce a plasma that will allow the user to easily complete the plasma process with the best results possible. Glow Research makes the entire system (RF generator, RF matching, control system, chamber and gas flow modules). Our systems are used in 3 shift/day production as well university/R&D applications. Our systems allow our Customer to attend to work they need to accomplish with the support of a reliable plasma cleaning or etching system.
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Testing and Samples
