AutoGlow Plasma Systems

AutoGlow Plasma System for Plasma cleaning, surface modification, photo resist removal

The AutoGlow plasma cleaning system (quartz chamber system) is a tabletop plasma chemistry reactor designed for R&D and production.

Used for plasma cleaning, argon plasma, oxygen plasma, PDMS bonding, oxygen plasma treatment, photo resist stripping, FA applications, Parylene removal, organic removal and lab or production use.

The AutoGlow plasma cleaning system is the most efficient system of its kind on the market because of its variable 10 watt to 300 watt, 13.56 MHz solid state generator.  Power (watts) can be adjusted in one watt increments. The AutoGlow plasma system is also designed to efficiently breakdown gases introduced to the system creating reactive species that will quickly clean or modify the sample.  Automatic tuning and a pressure readout are included.  The AutoGlow can strike a plasma as low as 10 watts!!  See video above.

Glow Research has taken the best designs of the old plasma cleaning systems, and updated the AutoGlow plasma system with current technology, including our proprietary phase magnitude detector and industrial RF network that allows efficient plasma tuning, and quick processing without the trouble of constantly adjusting to various sample loads.

PROCESS RESULTS and Customer comment:  “I wanted to let you know our systems are all running like champs, all 3 have already paid for themselves.”  Microchip, Corp., has been using several AutoGlow systems in a production environment (two shifts/day) for several years for descum and photoresist stripping.  They report that the quartz chamber AutoGlow system achieves a removal rate of 1,600 Angstroms per minute with a load of 25 wafers per run for photoresist stripping. 

System and all Modules are made by Glow Research: RF Generator, RF Match Network, Face Plate Module, Quartz Chamber and Gas Control Module.

We have several AutoGlow systems at MIT–here are instructions that may be of interest.  Click HERE

For a complete demonstration of the AutoGlow, Contact Us Today!  Click here

AutoGlow 200, AutoGlow 300

The AutoGlow 200 system is designed for 200 mm substrates or 8″ wafers, and can perform RIE or plasma processing–depending on which sample carrier used.  The anodized aluminum chamber can accommodate standard O2, Ar, SF6, or CF4 type gases for various applications.  The RF generator, match network and gas control are all made by Glow Research and designed for industrial production environments.  Optional larger chamber (AutoGlow 300) with two shelves–each shelf is 8.375” x 15” (213 mm x 381 mm).  See video below.  To review a Application Note on etch rates for the AutoGlow 200 click HERE.

The AutoGlow 200 and AutoGlow 300 have status diagnostic LED’s which confirms that all sub-modules are working correctly.   The AutoGlow 200 can be used for a variety of applications from plasma activation, plasma cleaning, organic removal,  pre-deposition cleaning as well as  etching applications.  The process chamber is anodized aluminum.  For a partial list of Glow Research Customers click HERE.

Low Cost AutoGlow 300LF: Just like the AutoGlow 300, but operates at 100 kHz with variable power control in one watt increments.  Two removable sample shelves.  Both the ground and the powered shelf measure 8.375” x 15” (213 mm x 381 mm).  100 kHz systems do not require a sophisticated tuning network, so we are able to pass the cost savings on to our Customers.  Price for this system is under 19,000.

Click here if you would like more information on this system.