AutoGlow Plasma Systems
Plasma cleaning system, surface modification, photo resist removal
The AutoGlow plasma cleaning system (quartz chamber system) is a tabletop plasma chemistry reactor designed for R&D and production.
Used for argon plasma, oxygen plasma, plasma coating, PDMS bonding, oxygen plasma treatment, photo resist stripping, FA applications, Parylene removal, organic removal and lab use.
The AutoGlow plasma cleaning system is the most efficient system of its kind on the market because of its variable 10 watt to 300 watt, 13.56 MHz solid state generator. Power (watts) can be adjusted in one watt increments. The AutoGlow plasma system is also designed to efficiently breakdown gases introduced to the system creating reactive species that will quickly clean or modify the sample. Automatic tuning and a pressure readout are included. The AutoGlow can strike a plasma as low as 10 watts!! See video above.
Glow Research has taken the best designs of the old plasma cleaning systems, and updated the AutoGlow plasma system with current technology, including our proprietary phase magnitude detector and industrial RF network that allows efficient plasma tuning, and quick processing without the trouble of constantly adjusting to various sample loads.
Easily replaceble Modules are made by Glow Research: RF Generator, RF Match Network, Face Plate Module, Quartz Chamber and Gas Control Module. For more data and information, please click on the AutoGlow brochure to the right of this page.
For a complete demonstration of the AutoGlow, Contact Us Today! Click here
The AutoGlow 200 system is designed for 200 mm substrates or 8″ wafers, and can perform RIE or plasma processing–depending on which sample carrier used. The anodized aluminum chamber can accommodate standard O2, Ar or CF4 type gases for various applications. The RF generator, match network and gas control are all made by Glow Research and designed for industrial production environments. Optional larger chamber with two shelves–each shelf is 8.375” x 15” (213 mm x 381 mm). See video below.
The AutoGlow 200 has status diagnostic LED’s which confirms that all sub-modules are working correctly. The AutoGlow 200 can be used for a variety of applications from plasma activation, plasma cleaning, organic removal, pre-deposition cleaning as well as etching applications. The process chamber is anodized aluminum.
Low Cost AutoGlow 200LF: Just like the AutoGlow 200, but operates at 100 kHz with variable power control. Two removable sample shelves. Both the ground and the powered shelf measure 8.375” x 15” (213 mm x 381 mm). 100 kHz systems do not require a sophisticated tuning network, so we are able to pass the cost savings on to our Customers. Price for this system is $18,900.
Click here if you would like more information on this system.
Optical Emission Spectroscopy Option: Two band pass filters are mounted and integrated into a view port window on the outside of the AutoGlow 200 chamber in order to monitor the plasma chemistry directly, and in real time.
By viewing the plasma discharge through a window to the chamber, this non-invasive technique can report plasma conditions without perturbation of the plasma process. By observing the increase or decrease in spectral intensity, the user can:
- sense an endpoint—and terminate the process
- check for vacuum leaks (by an increase in the nitrogen emission)
- confirm that all the organics have been removed (by a decrease in the carbon emission)
- “fingerprint” the plasma system under normal conditions for comparisons to the standard.
- rapid screening for air leaks, high moisture content or contamination.
- confirm that a chamber plasma clean has been complete (by confirming a return to the baseline)