AutoGlow Plasma System

Plasma cleaning system, surface modification, photo resist removal

The AutoGlow plasma cleaning system (quartz chamber system) is a tabletop plasma chemistry reactor designed for R&D and the production microelectronics community. The system is used in production as well as R&D centers.  Used for argon plasma, oxygen plasma, plasma coating, PDMS bonding, oxygen plasma treatment, photo resist stripping, FA applications, Parylene removal, organic removal and lab use.

Universities and  companies worldwide find the AutoGlow plasma system the perfect fit for their plasma needs.

The AutoGlow plasma cleaning system is the most efficient system of its kind on the market because of its variable 10 watt to 300 watt, 13.56 MHz solid state generator.  Power (watts) can be adjusted in one watt increments. The AutoGlow plasma system is also designed to efficiently breakdown gases introduced to the system creating reactive species that will quickly clean or modify the sample.  Automatic tuning and a pressure readout are included.  The AutoGlow can strike a plasma as low as 10 watts!!

Automatic/push-button operation.

Glow Research has taken the best designs of the old plasma cleaning systems, and updated the AutoGlow plasma system with current technology, including our proprietary phase magnitude detector and SimpleMatch RF network that allows efficient plasma tuning and provides quick processing without the trouble of constantly adjusting to various sample loads.

Easily replaceble Modules in the system are: RF Generator, RF Match Network, Face Plate Module (see below), Quartz Chamber and Gas Control Module. For more data and information, please click on the “AutoGlow Features” to the right on this page.

For a complete demonstration of the AutoGlow, Contact Us Today!

AutoGlow 200

The AutoGlow 200 system is designed for up to 200 mm substrates or 8″ wafers, and can perform RIE or plasma processing–depending on which sample carrier used.  The anodized aluminum chamber can accomidate standard O2, Ar or CF4 type gases for etching applications.  The well proven RF generator, match network and gas control is the same as the standard AutoGlow above.

The AutoGlow 200 has the same status diagnostic LED’s as the AutoGlow which confirms that all sub-modules are working correctly.  The system to the right  is shown with the optional nitrogen chamber vent purge. The AutoGlow 200 can be used for a varity of applications from plasma activation, cleaning, organic removal,  pre-deposition cleaningas well as a variety of etching applications.  The process chamber is anodized aluminum and can be made to fit various size requirements.

Optical Emission Spectroscopy:  Two band pass filters are mounted and integrated into a view port window on the outside of the AutoGlow 200 chamber in order to monitor the plasma chemistry directly, and in real time.  By viewing the plasma discharge through a window to the chamber, this non-

invasive technique can report plasma conditions without perturbation of the plasma  process.  By observing the increase or decrease in spectral intensity, the user can:

• sense an endpoint—and terminate the process
• check for vacuum leaks (by an increase in the nitrogen emission)
  

  Up to 300 watts or optional 600 watt generator

• confirm that all the organics have been removed (by a decrease in the carbon emission)
• “fingerprint” the plasma system under normal conditions for comparisons to the standard.
• rapid screening for air leaks, high moisture content or contamination.
• confirm that a chamber plasma clean has been complete (by confirming a return to the baseline)