- Reactive Sputter Deposition of Si3N4 or Other Films
- Eliminates need for Silane Gas
- Easy to Facilitate in a Lab, No Hazardous Gases Needed
- Up to Three Targets
- Deposit Dielectrics or Metals
- 200 mm Wafers (or smaller) or 156 mm x 156 mm Solar Cells
- Heating Options (up to 400 Degrees C)
- 1200 Watt, 13.56 MHz RF Generator
- Automatic Tuning
- Turbo and Backing Pump
- Water Cooled Magnetron Sputtering
- Stepper Controlled Substrate Handling
- Computer or Manual Control of Gauges
- MFC control of gases
- LED Diagnostics
Options
- Substrate Bias
- RGA
- Recirculating Target Cooling
- Viewport Windows
All SputterGlow systems comes with a 12 month warranty, owner’s manual, video on proper set up of the system and operation. Glow Research will also provide on-site field service support for the start up of the system.
For more information please call Glow Research USA 480-621-8405 or Email us.
