Configurable Plasma Processing for Production & Process Development

The AutoGlow 1100 is a fully integrated plasma processing system designed to provide a stable and controlled environment for cleaning, surface activation, treatment, modification, descum, and light etch applications.
By combining RF plasma generation, closed-loop pressure control, and mass flow–controlled gas delivery within a single platform, the system enables repeatable process conditions across both development and production workflows.
Key Features
● Stable RF Plasma Generation
13.56 MHz RF system with automatic matching and real-time power monitoring
● Closed-Loop Pressure Control
PID-controlled throttle valve with Baratron feedback for precise pressure regulation
● Mass Flow Controlled Gas Delivery
Multi-channel MFC system supporting oxygen, nitrogen, and air.
● Recipe-Based Process Control
Multi-step programmable recipes with control of gas flow, pressure, RF power, and timing
● Integrated Monitoring & Data Logging
Real-time system visibility with process data capture for validation and troubleshooting
● Integrated Safety Interlocks
Door,vacuum, and pressure interlocks designed to prevent unsafe operation
System Benefits
The AutoGlow 1100 is designed to deliver:
- Repeatable processing through coordinated control of RF power, pressure, and gas flow
- Process consistency across operators and production runs
- Flexible operation for both R&D and production environments
- Reduced variability through stable plasma conditions and controlled transitions
Customization & Configurability
The AutoGlow 1100 is designed as a configurable production plasma platform that can be tailored to specific process, facility, automation, and data collection requirements. Its modular design allows customers to select the hardware and software options best suited for their application.
- Available configurations and options include:
- Orbital-welded gas delivery with configurable MFC channel count and gas selection
- Wet or dry vacuum pump compatibility
- Configurable chamber and shelving arrangements
- Optional Verity optical endpoint detection
- Optional SECS/GEM automation interface
- Standard ballroom configuration or bulkhead mounting configuration
- Standard light tower
- Optional water vapor delivery
- Optional supervisory computer for SECS/GEM data handling and database upload
- Standard Genesis process data logging with CSV/Excel-compatible files
- Soft pumpdown and soft venting
- Temperature control and monitoring
This flexibility supports both process development environments and production integration, without requiring a complete system redesign.
Applications
The system supports a range of plasma processes, including:
- Photoresist stripping and descum
- Polymer and polyimide removal
- Plasma cleaning and surface preparation
- Surface activation and wettability improvement
- Light plasma etching
Compliance & Safety
The AutoGlow 1100 is designed in accordance with established industrial safety frameworks, including:
- SEMI S2 safety guidelines
- NFPA 79 electrical standards
The system incorporates interlocks, RF shielding, and lockout/tagout-compatible design to support safe operation in laboratory and production environments.
Summary
The AutoGlow 1100 provides a controlled and repeatable plasma processing environment through the integration of RF power delivery, gas control, pressure regulation, and recipe-based execution.
Its configurable architecture and stable process control make it suitable for a wide range of applications, from process development to production-scale operation.
