Plasma Clean prior to Deposition

This paper was written by individuals from the Weizmann Institute of Science in Israel:

See 2.1  Thin Film Preparation:

Si (100) substrates (1 cm x 1cm) samples were sonicated in ethyl acatate for 5 min., and then processed in an oxygen plasma system (AutoGlow, Glow Research, USA) for 3 min at 100 W.  Samples were then etched in 2 wt% HF solution for 2 min. 2nm of Cr adhesion layer was deposited on Si by electron beam evaporaton…..

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